Location: Strand Building S-3.01

System for the deposition of pure metallic films onto multiple substrates via thermal evaporation. The Evaporator is equipped with two shuttered thermal sources available for sequential deposition. Deposition takes place at High vacuum maintained by 345 L/s turbopump. A Quartz crystal controller allows for automated deposition thickness control.

This System requires at least 6 hours to reach an optimal vacuum. Sessions must be booked at the end of the day to load substrate and the next day (preferably morning), in order to complete the deposition.