Location: Strand Building S-1.15/16

Hitachi ion miller ideal for precise incisions on thin films and nano devices. 

5mm argon ion beam with a maximum flat milling rate of 20μm/hr or 300μm/hr for cross section milling. Stage rotation allows even milling of samples up to 50mm in width and 25mm in height. A sample observation port provides a view magnified by up to 100X